APPLICATION OF INTERFACE DEMARCATION TO STUDY OF FACET GROWTH AND SEGREGATION - GERMANIUM

被引:23
作者
WITT, AF
LICHTENSTEIGER, M
GATOS, HC
机构
[1] MIT, DEPT MET & MAT SCI, CAMBRIDGE, MA 02139 USA
[2] MIT, CTR MAT SCI & ENGN, CAMBRIDGE, MA 02139 USA
关键词
D O I
10.1149/1.2401919
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:787 / 790
页数:4
相关论文
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