SOURCES OF HIGH-POWER ION-BEAMS FOR TECHNOLOGICAL APPLICATIONS

被引：33

作者：

ISAKOV, IF

KOLODII, VN

OPEKUNOV, MS

MATVIENKO, VM

PECHENKIN, SA

REMNEV, GE

USOV, YP

机构：

[1] Nuclear Physics Institute

来源：

VACUUM | 1991年 / 42卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(91)90101-N

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This report describes two sources of high power ion beams of nanosecond duration. The first one produces ions with energy up to 125 keV, pulse duration from 20 to 200 ns, current density for heavy ions (Al+, Mg+, Fe+, W+, etc.) 1-2 A cm-2 and energy of 12 to 120 J deposited by the beam. The second one produces, respectively, 300 keV, 50 ns, 40 to 200 A cm-2 current of H+ and C+ ions and a kJ energy. The sources are powered by various diode systems and can be applied to scientific research and technology for materials science. © 1990.

引用

页码：159 / 162

页数：4

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