A NOVEL-APPROACH TO ORTHO-NITROBENZYL PHOTOCHEMISTRY FOR RESISTS

被引：63

作者：

REICHMANIS, E

WILKINS, CW

CHANDROSS, EA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571272

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1338 / 1342

页数：5

共 7 条

[1] AMIT B, 1974, ISRAEL J CHEM, V12, P103
[2] APPELBAUM J, 1975, OCT P KOD MICR SEM I
[3] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320
[4] Pillai V. N. R., 1980, SYNTHESIS, V1
[5] THE EFFECT OF SENSITIZERS ON THE PHOTODEGRADATION OF POLY (METHYL METHACRYLATE-CO-3-OXIMINO-2-BUTANONE METHACRYLATE)
REICHMANIS, E
WILKINS, CW
CHANDROSS, EA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (11) : 2514 - 2517
[6] REICHMANIS E, 1980, ORG COAT PLASTICS CH, V43, P243
[7] PRELIMINARY EVALUATION OF CO-POLYMERS OF METHYL-METHACRYLATE AND ACYLOXIMINO METHACRYLATE AS DEEP UV RESISTS
WILKINS, CW
REICHMANIS, E
CHANDROSS, EA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (11) : 2510 - 2513