MORPHOLOGY OF THIN SUPERCONDUCTING NB FILMS

被引：8

作者：

ALESSANDRINI, EI

LAIBOWITZ, RB

VIGGIANO, JM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570750

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：318 / 323

页数：6

共 12 条

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[2] SUPERCONDUCTING THIN FILMS OF NIOBIUM, TANTALUM, TANTALUM NITRIDE, TANTALUM CARBIDE, AND NIOBIUM NITRIDE [J].

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HALL, PM .

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BROERS, AN ;

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LAIBOWITZ, RB .

APPLIED PHYSICS LETTERS, 1973, 23 (07) :407-408

[6] ELECTRICAL CHARACTERISTICS OF RF-SPUTTERED SINGLE-CRYSTAL NIOBIUM FILMS [J].

MAYADAS, AF ;

LAIBOWITZ, RB ;

CUOMO, JJ .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) :1287-+

[7] VAPOR-DEPOSITED SUPERCONDUCTIVE FILMS OF NB, TA, + V [J].

NEUGEBAUER, CA ;

EKVALL, RA .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) :547-&

[8] PROXIMITY EFFECT BRIDGE AND SUPERCONDUCTING MICROCIRCUITRY [J].

NOTARYS, HA ;

MERCEREA.JE .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (04) :1821-1830

[9]

OSAMUHAMANO, 1979, THIN SOLID FILMS, V61, pL27

[10] HIGH-RATE RF SPUTTERED NIOBIUM - EFFECTS OF DEPOSITION RATE ON SUPERCONDUCTING PROPERTIES [J].

ROCK, FC ;

SMITH, CW .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) :2332-2333

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