RANGE OF SLOW POSITRONS IN METAL OVERLAYERS ON AL

被引：10

作者：

NIELSEN, B ^{[1
]}

LYNN, KG ^{[1
]}

LEUNG, TC ^{[1
]}

VANDERKOLK, GJ ^{[1
]}

VANIJZENDOORN, LJ ^{[1
]}

机构：

[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS

来源：

APPLIED PHYSICS LETTERS | 1990年 / 56卷 / 08期

关键词：

D O I：

10.1063/1.102694

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polycrystalline Pd and amorphous PdTa films on Al substrates were studied by a variable energy positron beam and by Rutherford backscattering. Since positron diffusion in the overlayers is limited, the range follows directly from the Doppler broadening as a function of incident positron energy. To observe possible effects of positron backscattering, a sandwich of Al/Pd/Al was studied as well. It was found that the mean penetration depth is not described well by z̄(E)=A(μg/cm2)×En(E), if A and n are assumed to be material and energy independent.

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页码：728 / 730

页数：3

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