MICROPATTERNING OF QUARTZ SUBSTRATES BY MULTIWAVELENGTH VACUUM-ULTRAVIOLET LASER-ABLATION

被引：49

作者：

SUGIOKA, K

WADA, S

TSUNEMI, A

SAKAI, T

TAKAI, H

MORIWAKI, H

NAKAMURA, A

TASHIRO, H

TOYODA, K

机构：

[1] TOKYO DENKI UNIV,CHIYODA KU,TOKYO 101,JAPAN

[2] SCI UNIV TOKYO,SHINJUKU KU,TOKYO 162,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 12B期

关键词：

LASER ABLATION; FUSED QUARTZ; MICROFABRICATION; VACUUM-ULTRAVIOLET (VUV) LASER; MULTIWAVELENGTH LASER; ANTI-STOKES RAMAN SCATTERING;

D O I：

10.1143/JJAP.32.6185

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Photoablation of synthetic fused quartz by simultaneous irradiation of multi-wavelength beams of a vacuum-ultraviolet (VUV) laser using high-order anti-Stokes Raman scattering is described. The VUV laser, which emits widely spread Raman-shifted lines from 133 nm to 594 nm, is ideal for effective laser ablation of the fused quartz. The well-defined patterns with a cross-sectional profile of a rectangular shape are formed by using a contact mask at an ablation rate as high as 13 nm/s. An effective absorption coefficient of 3.4 x 10(-5) cm-1, which indicates that the multi-wavelength irradiation effect has an important role in the process, is obtained.

引用

页码：6185 / 6189

页数：5

共 15 条

[1] EXCIMER LASER ETCHING OF POLYIMIDE [J].