EXCIMER LASER ETCHING OF POLYIMIDE

[1] Anders H., 1967, THIN FILMS OPTICS

[2] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[3] [Anonymous], 1978, INFRARED RAMAN SPECT

[4] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3579 - 3582

[5] Barashkov N. N., 1983, POLYM SCI USSR, V25, P1264

[6] BRAKER W, 1980, MATHESON GAS DATA BO

[7] BRANNON J, UNPUB

[8] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204

[9] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422

[10] GARRISON BJ, 1984, APPL PHYS LETT, V44, P9

[1] Anders H., 1967, THIN FILMS OPTICS

[2] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[3] [Anonymous], 1978, INFRARED RAMAN SPECT

[4] THE OPTICAL-PROPERTIES OF KAPTON - MEASUREMENT AND APPLICATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3579 - 3582

[5] Barashkov N. N., 1983, POLYM SCI USSR, V25, P1264

[6] BRAKER W, 1980, MATHESON GAS DATA BO

[7] BRANNON J, UNPUB

[8] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7201 - 7204

[9] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1420 - 1422

[10] GARRISON BJ, 1984, APPL PHYS LETT, V44, P9