SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE

被引：111

作者：

DEUTSCH, TF

GEIS, MW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1983年 / 54卷 / 12期

关键词：

D O I：

10.1063/1.331961

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：7201 / 7204

页数：4

共 8 条

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[2]

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KROHN, KE ;

STERN, LA .

APPLIED PHYSICS LETTERS, 1983, 43 (01) :74-76

[5] DEEP-ULTRAVIOLET SPATIAL-PERIOD DIVISION USING AN EXCIMER LASER [J].

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EHRLICH, DJ .

OPTICS LETTERS, 1982, 7 (09) :402-404

[6] SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION [J].

SRINIVASAN, R ;

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[7]

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[8] NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES) [J].

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