CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE .4. HARDNESS CHARACTERISTICS

被引：33

作者：

NIIHARA, K ^{[1
]}

HIRAI, T ^{[1
]}

机构：

[1] TOHOKU UNIV,IRON STEEL & MET RES INST,SENDAI,MIYAGI 980,JAPAN

来源：

关键词：

D O I：

10.1007/BF02426863

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1243 / 1252

页数：10

共 41 条

[1] SOME PROPERTIES OF VAPOR DEPOSITED SILICON NITRIDE FILMS USING SIH4-NH3-H2 SYSTEM
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