TANTALUM DOPING AND HIGH RESISTIVITY IN ALUMINIUM ANTIMONIDE

被引:7
作者
SHAW, D
MCKELL, HD
机构
来源
BRITISH JOURNAL OF APPLIED PHYSICS | 1963年 / 14卷 / 05期
关键词
D O I
10.1088/0508-3443/14/5/331
中图分类号
O59 [应用物理学];
学科分类号
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页码:295 / &
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