共 8 条
[1]
CHUNG PM, 1975, ELECTRIC PROBES STAT
[2]
EVIDENCE FOR THE OCCURRENCE OF SUBCUTANEOUS OXIDATION DURING LOW-TEMPERATURE REMOTE PLASMA ENHANCED DEPOSITION OF SILICON DIOXIDE FILMS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:576-580
[3]
LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1993, 11 (01)
:152-156
[4]
Irene E. A., 1985, Semiconductor International, V8, P91
[5]
DEVICE QUALITY SIO2 DEPOSITED BY DISTRIBUTED ELECTRON-CYCLOTRON RESONANCE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION WITHOUT SUBSTRATE HEATING
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS,
1992, 31 (10A)
:L1404-L1407
[6]
Sameshima T., 1993, Transactions of the Institute of Electronics, Information and Communication Engineers C-II, VJ76C-II, P235
[7]
LANGMUIR PROBE MEASUREMENTS OF THE ELECTRON-ENERGY DISTRIBUTION FUNCTION IN RADIOFREQUENCY PLASMAS
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1992, 10 (04)
:1207-1211