LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA

被引:293
作者
HOPWOOD, J
GUARNIERI, CR
WHITEHAIR, SJ
CUOMO, JJ
机构
[1] IBM Research Division, T. J. Watson Research Center, Yorktown Heights
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 01期
关键词
D O I
10.1116/1.578282
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this work a planar, radio frequency induction plasma source is characterized in terms of ion density, electron temperature, and plasma potential using a single Langmuir probe in oxygen and noble gases. Probe measurements of density were also verified using microwave interferometry. Measured argon ion densities increase nearly linearly with power from 1 x 10(11) cm-3 at 300 W rf power to 6 x 10(11) cm-3 at 1.2 kW at 1 x 10(-3) Torr. Krypton ion densities are also linear with power but saturate above 1 kW at a density of 2 x 10(12) cm-3 at 1 x 10(-3) Torr. Electron temperatures increase with decreasing pressure from 3 eV at 26 x 10(-3) Torr to 7 eV at 0.3 x 10(-3) Torr. Plasma potentials are typically 15-30 V and increase with decreasing pressure. Ion saturation current in oxygen at 5 x 10(-3) Torr is 2.5% uniform over diagonals of 20 cm when a magnetic multipole bucket is used to confine the plasma. lon generation energy cost in argon is 100-250 W/A.
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页码:152 / 156
页数:5
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