ELECTROMAGNETIC-FIELDS IN A RADIOFREQUENCY INDUCTION PLASMA

被引:188
作者
HOPWOOD, J
GUARNIERI, CR
WHITEHAIR, SJ
CUOMO, JJ
机构
[1] IBM Research Division, T. J. Watson Research Center, Yorktown Heights
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 01期
关键词
D O I
10.1116/1.578281
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The electromagnetic fields which drive a radio-frequency induction plasma are both modeled and measured. The plasma source consists of a planar, square coil separated from a low pressure plasma chamber by a 2.54-cm-thick quartz window. A small loop antenna, which is sealed in a pyrex tube, is immersed in the discharge to determine the magnitude and direction of the rf magnetic field. The measured B field is primarily radial and axial. Typical rf field strengths vary from 2 to 7 G for rf powers of 0.1-1 kW. The radial B field decays exponentially in the axial direction. The skin depth of the electromagnetic field is 1.6-3.6 cm which is consistent with Langmuir probe measured ion densities (typically 3 X 10(11) cm-3) in argon. Invoking Maxwell's equations to deduce the rf electric field from the measured B field, we find the E field to be primarily azimuthal. Peak field strengths increase from 100 V/m at 100 W to 200 V/m at 600 W where they saturate for higher powers. Finally, we present a 3D finite element solution for the fields produced by this plasma source which employs a cold, collisionless plasma model to relate the relative plasma permittivity epsilon(r) to the electron plasma frequency, omega(pe), using epsilon(r) = 1 - (omega(pe)/omega)2. The measured fields support this numerical solution.
引用
收藏
页码:147 / 151
页数:5
相关论文
共 10 条
  • [1] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
    ASMUSSEN, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 883 - 893
  • [2] BROWN SC, 1967, BASIC DATA PLASMA PH, P22
  • [3] BUTTENCOURT JA, 1986, FUNDAMENTALS PLASMA, P418
  • [4] COHEN SA, 1989, PLASMA ETCHING, P213
  • [5] GUARNIERI CR, 1991, UNPUB 38TH NAT S AM
  • [6] LANGMUIR PROBE MEASUREMENTS OF A RADIO-FREQUENCY INDUCTION PLASMA
    HOPWOOD, J
    GUARNIERI, CR
    WHITEHAIR, SJ
    CUOMO, JJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01): : 152 - 156
  • [7] Jackson J D, 1975, CLASSICAL ELECTRODYN, P298
  • [8] KELLER J, 1989, UNPUB 39TH GAS EL C
  • [9] KRALL NA, 1973, PRINCIPLES PLASMA PH, P48
  • [10] Singer P. H., 1991, Semiconductor International, V14, P46