ELECTROLYTIC BREAKDOWN CRYSTALLIZATION OF ANODIC OXIDE FILMS ON AL, TA AND TI

被引：146

作者：

YAHALOM, J

ZAHAVI, J

机构：

来源：

关键词：

D O I：

10.1016/0013-4686(70)80064-0

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1429 / &

共 13 条

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[3] ALADJEM A, 1968, INT C ELECTRON MICRO
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[5] A PROPOSED STRUCTURE FOR ANNEALED ANODIC OXIDE FILMS OF TANTALUM
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[J]. CANADIAN JOURNAL OF CHEMISTRY-REVUE CANADIENNE DE CHIMIE, 1962, 40 (10): : 1943 - &
[6] COTTON JB, 1963, T I CHEM ENG-LOND, V41, P11
[7] STRUCTURE OF ANODIC FILMS .1. AN ELECTRON DIFFRACTION EXAMINATION OF PRODUCTS OF ANODIC OXIDATION ON TANTALUM, NIOBIUM AND ZIRCONIUM
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[J]. ACTA METALLURGICA, 1963, 11 (08): : 873 - &
[8] CRYSTALLISATION OF THIN AMORPHOUS TANTALUM OXIDE FILMS HEATED IN AIR OR VACUO, AND STRUCTURE OF CRYSTALLINE OXIDE
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[J]. ACTA CRYSTALLOGRAPHICA, 1961, 14 (12): : 1278 - &
[9] HOAR TP, 1965, CORROS SCI, V5, P354
[10] THE CRYSTALLIZATION OF ANODIC TANTALUM OXIDE FILMS IN THE PRESENCE OF A STRONG ELECTRIC FIELD
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1955, 102 (05) : 207 - 214