A MULTIPURPOSE IMPLANTER WITH VARIOUS TARGET CHAMBERS FOR BASIC STUDIES ON THE INFLUENCE OF ION-BOMBARDMENT ON MATERIAL PROPERTIES

被引：17

作者：

FRECH, G

ENSINGER, W

MULLER, H

HANS, M

WOLF, GK

机构：

[1] Universität Heidelberg, Institut für Physikalische Chemie, 6900 Heidelberg

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1992年 / 68卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(92)96113-D

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A multipurpose apparatus with several exchangeable target chambers for implantation of gaseous and metal ions into various target materials is described. An ion beam from a Penning-type ion source with energies between 20 and 120 keV is mass-analyzed with a sector magnet and directed into a primary target chamber with target holders for flat and rotating cylindrical samples. In addition to this chamber several exchangeable chambers can be brought into the beam line. They ser-ve for irradiation of large area targets, under various angles with a goniometer. in situ Mossbauer spectroscopy, ion beam assisted vapour deposition or powder irradiation.

引用

页码：402 / 407

页数：6

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