THE DEVELOPMENT OF A SILICON-NITRIDE MASK TECHNOLOGY FOR SYNCHROTRON RADIATION X-RAY-LITHOGRAPHY

被引：6

作者：

VISSER, CCG ^{[1
]}

UGLOW, JE ^{[1
]}

BURNS, DW ^{[1
]}

WELLS, G ^{[1
]}

REDAELLI, R ^{[1
]}

CERRINA, F ^{[1
]}

GUCKEL, H ^{[1
]}

机构：

[1] WISCONSIN CTR X-RAY LITHOG,MADISON,WI 53706

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1988年 / 266卷 / 1-3期

关键词：

D O I：

10.1016/0168-9002(88)90466-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：686 / 690

页数：5

共 12 条

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[9] SILICON-NITRIDE SINGLE-LAYER X-RAY MASK [J].

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OHKUBO, T .

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[10]

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