HEATING AND TEMPERATURE-INDUCED DISTORTIONS OF SILICON X-RAY MASKS

被引:21
作者
HEINRICH, K
BETZ, H
HEUBERGER, A
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期
关键词
D O I
10.1116/1.582724
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:1352 / 1357
页数:6
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