INTENSE-PULSED PLASMA X-RAY SOURCES FOR LITHOGRAPHY - MASK DAMAGE EFFECTS

被引：9

作者：

HYMAN, HA

BALLANTYNE, A

FRIEDMAN, HW

REILLY, DA

SOUTHWORTH, RC

DYM, CL

机构：

[1] AVCO SYST DIV,WILMINGTON,MA 01887

[2] UNIV MASSACHUSETTS,DEPT CIVIL ENGN,AMHERST,MA 01002

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 04期

关键词：

D O I：

10.1116/1.571853

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1012 / 1016

页数：5

共 14 条

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FLANDERS, DC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1615 - 1619
[10] GROBMAN WD, 1980, IBM RC822035136 RES