GROWTH, STRUCTURE, AND MICROHARDNESS OF EPITAXIAL TIN/NBN SUPERLATTICES

被引:312
作者
SHINN, M [1 ]
HULTMAN, L [1 ]
BARNETT, SA [1 ]
机构
[1] LINKOPING UNIV,DEPT PHYS,DIV THIN FILM,S-58183 LINKOPING,SWEDEN
基金
美国国家科学基金会;
关键词
D O I
10.1557/JMR.1992.0901
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Epitaxial TiN/NbN superlattices with wavelengths LAMBDA ranging from 1.6 to 450 nm have been grown by reactive magnetron sputtering on MgO(100). Cross-sectional transmission electron microscopy (XTEM) studies showed well-defined superlattice layers. Voided low-angle boundaries, aligned perpendicular to the film plane, were also present. High-resolution images showed misfit dislocations for LAMBDA = 9.4 nm, but not LAMBDA = 4.6 nm. Up to ninth-order superlattice reflections were observed in diffraction, indicating that the interfaces were relatively sharp. Analysis of the first-order x-ray superlattice reflection intensities indicated that the composition modulation amplitude increased and the coherency strains decreased for LAMBDA-increased from 2 to 10 nm. Vickers microhardness H was found to increase rapidly with increasing-LAMBDA, from 1700 kg/mm2 for a TiN-NbN alloy (i.e., LAMBDA = 0) to a maximum of 4900 kg/mm2 at LAMBDA = 4.6 nm. H decreased gradually for further increases in LAMBDA above 4.6 nm, to H = 2500 kg/mm2 at LAMBDA = 450 nm. The hardness results are compared with theories for strengthening of multilayers.
引用
收藏
页码:901 / 911
页数:11
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