NANOINDENTATION STUDY OF THE MECHANICAL-PROPERTIES OF COPPER-NICKEL MULTILAYERED THIN-FILMS

被引：151

作者：

CAMMARATA, RC ^{[1
]}

SCHLESINGER, TE ^{[1
]}

KIM, C ^{[1
]}

QADRI, SB ^{[1
]}

EDELSTEIN, AS ^{[1
]}

机构：

[1] USN,RES LAB,WASHINGTON,DC 20375

来源：

APPLIED PHYSICS LETTERS | 1990年 / 56卷 / 19期

关键词：

D O I：

10.1063/1.103070

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The mechanical properties of multilayered Cu-Ni thin films with bilayer thicknesses of 1.6-12 nm were investigated by a nanoindentation technique. Force-displacement curves generated during loading and unloading of a diamond tip indenter were used to determine the hardness and elastic properties of the films. No enhancement in the elastic properties (supermodulus effect) was seen, but an enhancement in the hardness was observed. It is suggested that the enhancement, which displayed a Hall-Petch-type behavior, can be understood as owing to dislocation pinning at the interfaces analogous to the mechanism of grain boundary hardening.

引用

页码：1862 / 1864

页数：3

共 14 条

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