QUANTUM SIZE EFFECT OF EXCITONIC BAND-EDGE LUMINESCENCE IN STRAINED SI1-XGEX/SI SINGLE QUANTUM-WELL STRUCTURES GROWN BY GAS-SOURCE SI MOLECULAR-BEAM EPITAXY

被引:28
作者
FUKATSU, S [1 ]
YOSHIDA, H [1 ]
USAMI, N [1 ]
FUJIWARA, A [1 ]
TAKAHASHI, Y [1 ]
SHIRAKI, Y [1 ]
ITO, R [1 ]
机构
[1] UNIV TOKYO, FAC ENGN, DEPT APPL PHYS, BUNKYO KU, TOKYO 153, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1992年 / 31卷 / 9B期
关键词
STRAINED SI1-XGEX/SI SINGLE QUANTUM WELL; QUANTUM SIZE EFFECT; BAND-EDGE PHOTOLUMINESCENCE; EXCITONIC TRANSITION; GAS-SOURCE SI MOLECULAR BEAM EPITAXY;
D O I
10.1143/JJAP.31.L1319
中图分类号
O59 [应用物理学];
学科分类号
摘要
Strained SiGe/Si single quantum well structures were successfully grown by gas-source molecular beam epitaxy using disilane and germane. Quantum confined excitonic transitions of band-edge states dominated low-temperature photoluminescence (PL) spectra. The temperature dependence of PL intensity was in agreement with type-I quantum well formation. The quantum size effect was evidenced in these structures by the fact that the transition energy increased with decreasing well width.
引用
收藏
页码:L1319 / L1321
页数:3
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