ON THE CORROSION CHARACTERIZATION OF TITANIUM NITRIDE IN SULFURIC-ACID-SOLUTION

被引：16

作者：

CHYOU, SD ^{[1
]}

SHIH, HC ^{[1
]}

CHEN, TT ^{[1
]}

机构：

[1] NATL TSING HUA UNIV,DEPT MAT SCI & ENGN,HSINCHU 300,TAIWAN

来源：

CORROSION SCIENCE | 1993年 / 35卷 / 1-4期

关键词：

D O I：

10.1016/0010-938X(93)90165-D

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The sulfuric acid corrosion behavior of TiN-coating on stainless steel, prepared by plasma enhanced physical vapor deposition (PVD), was studied by using a perforation test, dynamic and static polarizations and open-circuit potential (OCP) measurements. It was found that the corrosion of TiN strongly depended on the concentration of H2SO4. For the range of 0.1-10 N H2SO4, the corrosion rate increased, while for 10-36 N acid, it decreased with the acid concentration. It was also noted that the corrosion rates of 20-36 N acid were much lower than those of 0.1-20 N solution. For 0.1-20 N sulfuric acid, X-ray photoelectron spectra (XPS) accompanied by thermodynamic considerations allowed determination of the chemical states of the corrosion products and the related chemical reactions. For 20-36 N sulfuric acid, a passivation model has been proposed.

引用

页码：337 / 347

页数：11

共 20 条

[1] RELATION BETWEEN THE HUE AND COMPOSITION OF TICXNY FILMS PREPARED USING MULTIPLE HOLLOW-CATHODE DISCHARGE ION PLATING [J].

AOKI, I ;

FUKUTOME, R ;

ENOMOTO, Y .

THIN SOLID FILMS, 1985, 130 (3-4) :253-260

[2] X-RAY PHOTOELECTRON-SPECTRA OF SEVERAL OXIDES OF IRON AND CHROMIUM [J].

ASAMI, K ;

HASHIMOTO, K .

CORROSION SCIENCE, 1977, 17 (07) :559-570

[3]

Baes C.F., 1976, HYDROLYSIS CATIONS

[4] A STUDY OF THE CORROSION BEHAVIOR OF TIN FILMS [J].

ERDEMIR, A ;

CARTER, WB ;

HOCHMAN, RF ;

MELETIS, EI .

MATERIALS SCIENCE AND ENGINEERING, 1985, 69 (01) :89-93

[5]

FELDMAN DP, 1975, RUSS J PHYS CHEM, V49, P1858

[6]

FONTANA MG, 1986, CORROSION ENG, P462

[7] TIN COATINGS ON M2 STEEL PRODUCED BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION [J].

HILTON, MR ;

VANDENTOP, GJ ;

SALMERON, M ;

SOMORJAI, GA .

THIN SOLID FILMS, 1987, 154 (1-2) :377-386

[8]

KLOOS KH, 1981, THIN SOLID FILMS, V80, P307

[9] TITANIUM NITRIDE FILM AS A PROTECTIVE COATING FOR A VACUUM DEPOSITION CHAMBER [J].

KOMIYA, S ;

UMEZU, N ;

HAYASHI, C .

THIN SOLID FILMS, 1979, 63 (02) :341-346

[10]

LI PX, 1986, J VAC SCI TECHNOL A, V5, P187

← 1 2 →