ION-IMPLANTATION FOR OPTICAL APPLICATIONS

被引：10

作者：

BUCHAL, C

机构：

[1] Institute for Thin Film Technology (ISI-2), Forschungszentrum GmbH KFA

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 96卷 / 1-2期

关键词：

D O I：

10.1016/0168-583X(95)80011-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Four different classes of experiments are reviewed, which demonstrate the successful use of ion implantation for optical applications: isolation implantation for the fabrication of semiconductor laser diodes, metallic nanocluster formation for controlled Mie scattering, optical waveguide patterning by exploiting implantation induced lattice damage in oxide crystals, and the direct doping of LiNbO3 with optically active erbium ions, demonstrating the interplay of amorphization, random nucleation and growth and solid phase epitaxy.

引用

页码：370 / 373

页数：4

共 16 条

[1]

BUCHAL C, 1994, ANNU REV MATER SCI, V24, P125

[2]

FIELD SJ, 1991, LASERS ELECTROOPTICS, V10, P404

[3] RAPID THERMAL ANNEALING OF MEV ERBIUM IMPLANTED LINBO3 SINGLE-CRYSTALS FOR OPTICAL DOPING [J].