DEPOSITION AND PROPERTIES OF MOS2 THIN-FILMS GROWN BY PULSED LASER EVAPORATION

被引：57

作者：

DONLEY, MS

MURRAY, PT

BARBER, SA

HAAS, TW

机构：

[1] UNIV DAYTON,RES INST,DAYTON,OH 45469

[2] BATTELLE MEM INST,COLUMBUS,OH 43201

来源：

SURFACE & COATINGS TECHNOLOGY | 1988年 / 36卷 / 1-2期

关键词：

D O I：

10.1016/0257-8972(88)90163-6

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：329 / 340

页数：12

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[9]

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[10]

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