QUANTIFICATION OF SURFACE HYDROXIDES USING CHEMICAL LABELING AND XPS

被引：16

作者：

DANG, TA

GNANASEKARAN, R

DEPPE, DD

机构：

[1] Gte Products Corporation, Towanda, Pennsylvania

来源：

SURFACE AND INTERFACE ANALYSIS | 1992年 / 18卷 / 02期

关键词：

D O I：

10.1002/sia.740180214

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

XPS when used in conjunction with silylation can determine surface hydroxide. The penetration depth was studied using DRIFT and various silylation conditions. Application of this technique to many different inorganic matrices, including Si3N4, glass, silica thin film, zinc silicate lamp phosphor and Al2O3, is illustrated.

引用

页码：141 / 146

页数：6

共 14 条

[1]

ARKELS B, 1977, CHEMTECH, V7, P766

[2]

BRIGGS D, 1983, PRACTICAL SURFACE AN, P359

[3]

Butler K.H, 1980, FLUORESCENT LAMP PHO

[4] DETERMINATION OF AMINO AND SILANOL FUNCTIONAL-GROUPS ON GLASS VIA CHEMICAL DERIVATIZATION AND ESCA [J].