ENHANCEMENT OF ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS OF SURFACE SILANOL IN SILICON-NITRIDE THROUGH CHEMICAL DERIVATIZATION

被引:7
作者
DANG, TA [1 ]
GNANASEKARAN, R [1 ]
机构
[1] MANSFIELD UNIV,MANSFIELD,PA 16933
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 03期
关键词
D O I
10.1116/1.577636
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The surface silanol on Si3N4 can be successfully determined by reaction of the OH group with tridecafluoro-1,1,2,2-tetrahydrooctyl-1-1-trichlorosilane and subsequent electron spectroscopy for chemical analysis for F. The technique offers both specificity and very high sensitivity. It also has certain advantages over diffuse reflectance infrared Fourier transform, including more surface probing, better quantification, and a significantly lower detection limit.
引用
收藏
页码:1406 / 1409
页数:4
相关论文
共 7 条
[1]  
ARKLES B, 1987, SILICON COMPOUNDS RE, P54
[2]   DETERMINATION OF AMINO AND SILANOL FUNCTIONAL-GROUPS ON GLASS VIA CHEMICAL DERIVATIZATION AND ESCA [J].
DANG, TA ;
GNANASEKARAN, R .
SURFACE AND INTERFACE ANALYSIS, 1990, 15 (02) :113-118
[3]   X-RAY PHOTOELECTRON-SPECTROSCOPY OF THERMALLY TREATED SIO2 SURFACES [J].
MILLER, ML ;
LINTON, RW .
ANALYTICAL CHEMISTRY, 1985, 57 (12) :2314-2319
[4]   X-RAY PHOTOELECTRON AND AUGER-ELECTRON SPECTROSCOPY STUDIES OF PHOTOCHEMICAL VAPOR-DEPOSITION SILICON NITRIDES [J].
PADMANABHAN, R ;
SAHA, NC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2226-2231
[5]  
RAHMAN M, 1986, AM CERAM SOC BJ, V65, P1171
[6]   SURFACE OXIDATION OF SILICON-NITRIDE FILMS [J].
RAIDER, SI ;
FLITSCH, R ;
ABOAF, JA ;
PLISKIN, WA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (04) :560-565
[7]   DIFFUSE REFLECTANCE INFRARED SPECTROSCOPIC CHARACTERIZATION OF SILICA DEHYDROXYLATION [J].
WHITE, RL ;
NAIR, A .
APPLIED SPECTROSCOPY, 1990, 44 (01) :69-75