X-RAY PHOTOELECTRON AND AUGER-ELECTRON SPECTROSCOPY STUDIES OF PHOTOCHEMICAL VAPOR-DEPOSITION SILICON NITRIDES

被引：14

作者：

PADMANABHAN, R

SAHA, NC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1116/1.575015

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2226 / 2231

页数：6

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