PHOTO-CVD FOR VLSI ISOLATION

被引：38

作者：

CHEN, JYT

HENDERSON, RC

HALL, JT

PETERS, JW

机构：

[1] HUGHES RES LABS, MALIBU, CA 90265 USA

[2] HUGHES AIRCRAFT CO, EL SEGUNDO, CA 90245 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1984年 / 131卷 / 09期

关键词：

D O I：

10.1149/1.2116038

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2146 / 2151

页数：6

共 28 条

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