学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
RADIATION EFFECTS OF E-BEAM FABRICATED SUB-MICRON NMOS TRANSISTORS
被引:16
作者
:
CHEN, JY
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
CHEN, JY
HENDERSON, RC
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
HENDERSON, RC
PATTERSON, DO
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
PATTERSON, DO
MARTIN, R
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
MARTIN, R
机构
:
[1]
USN,RES LAB,WASHINGTON,DC 20375
[2]
USN ACAD,ANNAPOLIS,MD 21402
来源
:
ELECTRON DEVICE LETTERS
|
1982年
/ 3卷
/ 01期
关键词
:
D O I
:
10.1109/EDL.1982.25457
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:13 / 15
页数:3
相关论文
共 9 条
[1]
1 MU-M MOSFET VLSI TECHNOLOGY .8. RADIATION EFFECTS
AITKEN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
AITKEN, JM
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 294
-
301
[2]
BOROFSKY AJ, 1981, MAY P U GOV IND MICR
[3]
Chen J., UNPUB
[4]
RADIATION-LEVELS ASSOCIATED WITH ADVANCED LITHOGRAPHIC TECHNIQUES
GALLOWAY, KF
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
GALLOWAY, KF
MAYO, S
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
MAYO, S
ROITMAN, P
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
ROITMAN, P
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(12)
: 2245
-
2248
[5]
EFFECTS OF PROCESSING ON RADIATION-DAMAGE IN SIO2
GDULA, RA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Corporation, East Fishkill Facility, NY 12533, Hopewell Junction
GDULA, RA
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 644
-
647
[6]
CO-60 RADIATION EFFECTS ON DRY HIGH-PRESSURE OXIDES
GUPTA, A
论文数:
0
引用数:
0
h-index:
0
GUPTA, A
PANCHOLY, RK
论文数:
0
引用数:
0
h-index:
0
PANCHOLY, RK
SPERO, J
论文数:
0
引用数:
0
h-index:
0
SPERO, J
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
: 1749
-
1752
[7]
HOLE TRANSPORT IN MOS OXIDES
HUGHES, RC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
HUGHES, RC
EERNISSE, EP
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
EERNISSE, EP
STEIN, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
STEIN, HJ
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2227
-
2233
[8]
CONSIDERATIONS FOR HARDENING MOS DEVICES AND CIRCUITS FOR LOW RADIATION-DOSES
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
MCGARRITY, JM
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
: 1739
-
1744
[9]
1 MU-M MOSFET VLSI TECHNOLOGY .4. HOT-ELECTRON DESIGN CONSTRAINTS
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
NING, TH
COOK, PW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
COOK, PW
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
DENNARD, RH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
OSBURN, CM
SCHUSTER, SE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
SCHUSTER, SE
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
YU, HN
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 268
-
275
←
1
→
共 9 条
[1]
1 MU-M MOSFET VLSI TECHNOLOGY .8. RADIATION EFFECTS
AITKEN, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
AITKEN, JM
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 294
-
301
[2]
BOROFSKY AJ, 1981, MAY P U GOV IND MICR
[3]
Chen J., UNPUB
[4]
RADIATION-LEVELS ASSOCIATED WITH ADVANCED LITHOGRAPHIC TECHNIQUES
GALLOWAY, KF
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
GALLOWAY, KF
MAYO, S
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
MAYO, S
ROITMAN, P
论文数:
0
引用数:
0
h-index:
0
机构:
National Bureau of Standards, Electron Devices Division, Washington
ROITMAN, P
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(12)
: 2245
-
2248
[5]
EFFECTS OF PROCESSING ON RADIATION-DAMAGE IN SIO2
GDULA, RA
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Corporation, East Fishkill Facility, NY 12533, Hopewell Junction
GDULA, RA
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
: 644
-
647
[6]
CO-60 RADIATION EFFECTS ON DRY HIGH-PRESSURE OXIDES
GUPTA, A
论文数:
0
引用数:
0
h-index:
0
GUPTA, A
PANCHOLY, RK
论文数:
0
引用数:
0
h-index:
0
PANCHOLY, RK
SPERO, J
论文数:
0
引用数:
0
h-index:
0
SPERO, J
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
: 1749
-
1752
[7]
HOLE TRANSPORT IN MOS OXIDES
HUGHES, RC
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
HUGHES, RC
EERNISSE, EP
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
EERNISSE, EP
STEIN, HJ
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
STEIN, HJ
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2227
-
2233
[8]
CONSIDERATIONS FOR HARDENING MOS DEVICES AND CIRCUITS FOR LOW RADIATION-DOSES
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
MCGARRITY, JM
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1980,
27
(06)
: 1739
-
1744
[9]
1 MU-M MOSFET VLSI TECHNOLOGY .4. HOT-ELECTRON DESIGN CONSTRAINTS
NING, TH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
NING, TH
COOK, PW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
COOK, PW
DENNARD, RH
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
DENNARD, RH
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
OSBURN, CM
SCHUSTER, SE
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
SCHUSTER, SE
YU, HN
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Thomas J. Watson Research Center, Yorktown Heights
YU, HN
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
: 268
-
275
←
1
→