SURFACE OXIDATION OF SILICON-NITRIDE FILMS

被引：258

作者：

RAIDER, SI ^{[1
]}

FLITSCH, R ^{[1
]}

ABOAF, JA ^{[1
]}

PLISKIN, WA ^{[1
]}

机构：

[1] IBM CORP,SYST PROD DIV,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 04期

关键词：

D O I：

10.1149/1.2132877

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：560 / 565

页数：6

相关论文

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