PREPARATION AND CHARACTERIZATION OF CHROMIUM(III) OXIDE-FILMS BY A NOVEL SPRAY PYROLYSIS METHOD

被引：16

作者：

QIAN, YT

KERSHAW, R

DWIGHT, K

WOLD, A

机构：

[1] Department of Chemistry, Brown University Providence

[2] On leave from Department, Applied Chemistry University of Science and Technology of China Hefei, Anhui

来源：

MATERIALS RESEARCH BULLETIN | 1990年 / 25卷 / 10期

基金：

美国国家科学基金会;

关键词：

Chromium Compounds - Synthesis - Dielectric Materials - Thin Films - Films - Physical Properties - Organometallics - Pyrolysis;

D O I：

10.1016/0025-5408(90)90080-L

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Chromium (III) oxide films of 2000A thickness were deposited on n-type silicon wafers by a novel spray pyrolysis method. Different spray solutions, all containing a chromium acetylacetonate complex, gave different rates of film deposition. IR spectroscopy of these films confirmed them to be α-Cr2O3. The deposited films of α-Cr2O3 were found to be homogeneous and uniform with breakdown potentials in excess of 20 V. The characteristics of films prepared from different spray solutions are compared and discussed. © 1990.

引用

页码：1243 / 1250

页数：8

共 13 条

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