A DC TECHNIQUE FOR DETERMINING GAAS-MESFET THERMAL-RESISTANCE

被引:32
作者
ESTREICH, DB
机构
[1] Hewlett-Packard Co, Santa Rosa, CA,, USA
来源
IEEE TRANSACTIONS ON COMPONENTS HYBRIDS AND MANUFACTURING TECHNOLOGY | 1989年 / 12卷 / 04期
关键词
Electric Measurements - Semiconducting Gallium Arsenide;
D O I
10.1109/33.49032
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel DC electrical method (DCEM) for measuring the thermal resistance of GaAs MESFETs using the temperature dependence of the gate metal resistivity is described. The method requires a DC current to be passed (end-to-end) through the gate stripe to monitor the average temperature of the channel. The DCEM can measure the average thermal resistance over the entire operating range of a Schottky-gate MESFET using only DC measuring instruments. An example is given showing the thermal resistance of an ion-implanted 0.5-μm GaAs MESFET as a function of DC power dissipation.
引用
收藏
页码:675 / 679
页数:5
相关论文
共 9 条
[1]  
Fukui H., 1980, International Electron Devices Meeting. Technical Digest, P118
[2]  
PEAKE AH, 1984, DEC P SEM THERM TEMP
[3]  
ROESCH WJ, 1988, NOV GAAS IC S NASHV, P61
[4]  
Siegal B. S., 1977, Microwave Systems News, V7, P67
[5]   SURFACE-TEMPERATURE LIMIT DETECTOR USING NEMATIC LIQUID-CRYSTALS WITH AN APPLICATION TO MICROCIRCUITS [J].
STEPHENS, CE ;
SINNADURAI, FN .
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1974, 7 (08) :641-643
[6]  
VANTUYL RL, 1982, IEEE T ELECTRON DEV, V29, P1031
[7]  
VANTUYL RL, 1981, OCT IEEE GALL ARS IN
[8]  
WALSHAK LG, 1977, MICROWAVE J, V16, P62
[9]   2-DIMENSIONAL NUMERICAL-ANALYSIS OF STABILITY-CRITERIA OF GAAS FETS [J].
YAMAGUCHI, K ;
ASAI, S ;
KODERA, H .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1976, 23 (12) :1283-1290