ELECTROCHEMICAL-BEHAVIOR OF COPPER ELECTRODE IN CONCENTRATED SULFURIC-ACID-SOLUTIONS

被引:76
作者
MOREIRA, AH
BENEDETTI, AV
CABOT, PL
SUMODJO, PTA
机构
[1] UNIV BARCELONA,DEPT QUIM FIS,E-08028 BARCELONA,SPAIN
[2] UNIV SAO PAULO,INST QUIM,BR-01498 SAO PAULO,BRAZIL
关键词
COPPER; SULFURIC ACID; POTENTIODYNAMIC STUDIES; CYCLIC VOLTAMMETRY; DISSOLUTION PRECIPITATION PROCESS;
D O I
10.1016/0013-4686(93)87018-9
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electrochemical behaviour of copper in 6.0 mol l-1 sulfuric acid at 30-degrees-C, was studied by means of the potentiodynamic method. At low potential sweep rates, v < 200 mV s-1, the data reveal that the anodic process is basically constituted of copper dissolution and a film formation which inhibits further metal oxidation and which may undergo further dissolution. For higher potential sweep rates, a modification in the passivation region of the voltammogram is observed. It can be ascribed to a change in the passivation mechanism which possibly involves different surface species. The kinetic relationships derived from the potentiodynamic I/E curves obtained at low v suggest a film formation via a dissolution/precipitation mechanism.
引用
收藏
页码:981 / 987
页数:7
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