HALF-WIDTH AND PEAK-INTENSITY MEASUREMENT OF A ROCKING CURVE OBTAINED FROM SILICON ON SAPPHIRE USING SOFT-X-RAY BEAMS

被引：6

作者：

KISHINO, S

IIDA, S

AOKI, S

MIZUTANI, T

WATANABE, T

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

[2] HITACHI LTD,DIV SEMICONDUCTOR & INTEGRATED CIRCUIT,KODAIRA,TOKYO 187,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 07期

关键词：

D O I：

10.1063/1.324043

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3138 / 3140

页数：3

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