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CHARACTERIZATION OF ALUMINUM ALUMINUM NITRIDE COATINGS SPUTTER DEPOSITED USING THE PULSED GAS PROCESS

被引：18
作者：
SPRINGER, RW
HOSFORD, CD
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 03期
关键词：
D O I：
10.1116/1.571334
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：462 / 465
页数：4
相关论文
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