THE MORPHOLOGY OF ELECTROLESS NI DEPOSITION ON A COLLOIDAL PD(II) CATALYST

被引:89
作者
BRANDOW, SL [1 ]
DRESSICK, WJ [1 ]
MARRIAN, CRK [1 ]
CHOW, GM [1 ]
CALVERT, JM [1 ]
机构
[1] USN, RES LAB, DIV ELECTR SCI & TECHNOL, WASHINGTON, DC 20375 USA
关键词
D O I
10.1149/1.2044280
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The surface morphology of a surface-bound colloidal Pd(II) catalyst and its effect on the particle size of an electroless Ni deposit is examined. The deposited catalyst is found to have a broad distribution of particle sizes with the largest particles reaching approximately 50 nm in diameter. Catalyst surface coverages as low as 20% are found to be sufficient to initiate complete and homogenous metallization. The distribution of particle sizes for the electroless metal deposit, found to be a function of plating time, is broad with the maximum Ni particle size exceeding 120 nm. Results indicate controlling the size of the bound catalyst is the principal determining factor in controlling the particle size of the electroless deposit. Modification of the surface by depleting the concentration of surface functional groups capable of binding catalyst is used to shift the size distribution of bound catalyst to smaller values. A resulting three- to fourfold reduction in the particle size of the electroless deposit is demonstrated.
引用
收藏
页码:2233 / 2243
页数:11
相关论文
共 47 条
  • [1] ARKLES B, 1992, 1992 HULS SILICON CO, P59
  • [2] A STM STUDY OF PD-CATALYST FOR ELECTROLESS CU DEPOSITION ON NONCONDUCTORS BY MEANS OF A MODIFIED GRAPHITE SUBSTRATE
    BESENHARD, JO
    KREBBER, U
    HORBER, JKH
    KANANI, N
    MEYER, H
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1989, 136 (12) : 3608 - 3610
  • [3] MECHANISMS OF ELECTROLESS METAL PLATING .2. FORMALDEHYDE OXIDATION
    BINDRA, P
    ROLDAN, J
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (11) : 2581 - 2589
  • [4] DEEP UV PHOTOCHEMISTRY AND PATTERNING OF SELF-ASSEMBLED MONOLAYER FILMS
    CALVERT, JM
    GEORGER, JH
    PECKERAR, MC
    PEHRSSON, PE
    SCHNUR, JM
    SCHOEN, PE
    [J]. THIN SOLID FILMS, 1992, 210 (1-2) : 359 - 363
  • [5] PROJECTION X-RAY-LITHOGRAPHY WITH ULTRATHIN IMAGING LAYERS AND SELECTIVE ELECTROLESS METALLIZATION
    CALVERT, JM
    KOLOSKI, TS
    DRESSICK, WJ
    DULCEY, CS
    PECKERAR, MC
    CERRINA, F
    TAYLOR, JW
    SUH, DW
    WOOD, OR
    MACDOWELL, AA
    DSOUZA, R
    [J]. OPTICAL ENGINEERING, 1993, 32 (10) : 2437 - 2445
  • [6] DEEP ULTRAVIOLET PATTERNING OF MONOLAYER FILMS FOR HIGH-RESOLUTION LITHOGRAPHY
    CALVERT, JM
    CHEN, MS
    DULCEY, CS
    GEORGER, JH
    PECKERAR, MC
    SCHNUR, JM
    SCHOEN, PE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3447 - 3450
  • [7] CALVERT JM, 1992, MATER RES SOC SYMP P, V260, P905, DOI 10.1557/PROC-260-905
  • [8] CALVERT JM, 1991, SOLID STATE TECHNOL, V34, P77
  • [9] CALVERT JM, 1992, IN PRESS AM CHEM SOC
  • [10] CALVERT JM, IN PRESS J VAC SCI B