KINETICS OF PROTON-EXCITED AR-F2 AND KR-F2 MIXTURES

被引：15

作者：

CHEN, CH

PAYNE, MG

机构：

[1] Oak Ridge National Laboratory, Oak Ridge

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1979年 / 15卷 / 03期

关键词：

D O I：

10.1109/JQE.1979.1069984

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Mixtures of Ar and F2 and of Kr and F2 were excited with pulsed proton beams. Time-resolved spectra as well as time-integrated spectra were employed to study the detailed mechanism of production and quenching processes of ArF*, KrF*, Ar2F*, and Kr2F*. The kinetics of ArF*, KrF*, and XeF* lasers are discussed briefly. © 1979 IEEE

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页码：149 / 161

页数：13

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