ANNEALING BEHAVIOUR IN VACUUM-DEPOSITED FILMS OF SILICON OXIDE

[1] ALLAM DS, 1967, THIN SOLID FILMS, V1, P28

[2] BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141

[3] LOW-PASS ACTIVE FILTERS [J]. RADIO AND ELECTRONIC ENGINEER, 1967, 34 (02): : 90 - &

[4] CAMPBELL DS, 1968, HANDBOOK THIN FILM T

[5] STRUCTURE OF SILICON OXIDE FILMS [J]. PHYSICA STATUS SOLIDI, 1967, 22 (02): : 593 - &

[6] DRUMHELLOR CE, 1960, 7 T VAC S CLEV

[7] Self-Diffusion in Simple Oxides (A Bibliography) [J]. JOURNAL OF MATERIALS SCIENCE, 1968, 3 (02) : 206 - 222

[8] HIROSE H, 1964, JPN J APPL PHYS, V3, P179

[9] JOHANSEN IT, 1966, J APPL PHYS, V37, P2

[10] MAISSEL L, 1968, HANDBOOK THIN FIL ED

[1] ALLAM DS, 1967, THIN SOLID FILMS, V1, P28

[2] BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141

[3] LOW-PASS ACTIVE FILTERS [J]. RADIO AND ELECTRONIC ENGINEER, 1967, 34 (02): : 90 - &

[4] CAMPBELL DS, 1968, HANDBOOK THIN FILM T

[5] STRUCTURE OF SILICON OXIDE FILMS [J]. PHYSICA STATUS SOLIDI, 1967, 22 (02): : 593 - &

[6] DRUMHELLOR CE, 1960, 7 T VAC S CLEV

[7] Self-Diffusion in Simple Oxides (A Bibliography) [J]. JOURNAL OF MATERIALS SCIENCE, 1968, 3 (02) : 206 - 222

[8] HIROSE H, 1964, JPN J APPL PHYS, V3, P179

[9] JOHANSEN IT, 1966, J APPL PHYS, V37, P2

[10] MAISSEL L, 1968, HANDBOOK THIN FIL ED