SENSITIVITY OF RESIST-COATED SILICON SLICES TO ARGON-LASER WAVELENGTHS

被引:2
作者
BEESLEY, MJ
CASTLEDINE, JG
COOPER, DP
机构
[1] Services Electronics Research Laboratory Baidock, Herts.
关键词
D O I
10.1049/el:19690197
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The threshold energy density required to expose a given thickness of resist is determined, over a range of intensities, for three different resists and several argon-laser wavelengths. © 1969, The Institution of Electrical Engineers. All rights reserved.
引用
收藏
页码:257 / +
页数:1
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[2]   MULTIPLE IMAGING BY MEANS OF POINT HOLOGRAMS [J].
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APPLIED OPTICS, 1968, 7 (08) :1643-&
[3]  
HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169
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