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SENSITIVITY OF RESIST-COATED SILICON SLICES TO ARGON-LASER WAVELENGTHS
被引:2
作者
:
BEESLEY, MJ
论文数:
0
引用数:
0
h-index:
0
机构:
Services Electronics Research Laboratory Baidock, Herts.
BEESLEY, MJ
CASTLEDINE, JG
论文数:
0
引用数:
0
h-index:
0
机构:
Services Electronics Research Laboratory Baidock, Herts.
CASTLEDINE, JG
COOPER, DP
论文数:
0
引用数:
0
h-index:
0
机构:
Services Electronics Research Laboratory Baidock, Herts.
COOPER, DP
机构
:
[1]
Services Electronics Research Laboratory Baidock, Herts.
来源
:
ELECTRONICS LETTERS
|
1969年
/ 5卷
/ 12期
关键词
:
D O I
:
10.1049/el:19690197
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
The threshold energy density required to expose a given thickness of resist is determined, over a range of intensities, for three different resists and several argon-laser wavelengths. © 1969, The Institution of Electrical Engineers. All rights reserved.
引用
收藏
页码:257 / +
页数:1
相关论文
共 4 条
[1]
HOLOGRAPHIC PROJECTION OF MICROCIRCUIT PATTERNS
[J].
BEESLEY, MJ
论文数:
0
引用数:
0
h-index:
0
BEESLEY, MJ
;
FOSTER, H
论文数:
0
引用数:
0
h-index:
0
FOSTER, H
;
HAMBLETON, KG
论文数:
0
引用数:
0
h-index:
0
HAMBLETON, KG
.
ELECTRONICS LETTERS,
1968,
4
(03)
:49
-+
[2]
MULTIPLE IMAGING BY MEANS OF POINT HOLOGRAMS
[J].
GROH, G
论文数:
0
引用数:
0
h-index:
0
GROH, G
.
APPLIED OPTICS,
1968,
7
(08)
:1643
-&
[3]
HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169
[4]
SUN L, 1968, P IEEE, V56, P116
←
1
→
共 4 条
[1]
HOLOGRAPHIC PROJECTION OF MICROCIRCUIT PATTERNS
[J].
BEESLEY, MJ
论文数:
0
引用数:
0
h-index:
0
BEESLEY, MJ
;
FOSTER, H
论文数:
0
引用数:
0
h-index:
0
FOSTER, H
;
HAMBLETON, KG
论文数:
0
引用数:
0
h-index:
0
HAMBLETON, KG
.
ELECTRONICS LETTERS,
1968,
4
(03)
:49
-+
[2]
MULTIPLE IMAGING BY MEANS OF POINT HOLOGRAMS
[J].
GROH, G
论文数:
0
引用数:
0
h-index:
0
GROH, G
.
APPLIED OPTICS,
1968,
7
(08)
:1643
-&
[3]
HTOO MS, 1968, PHOTOGR SCI ENG, V12, P169
[4]
SUN L, 1968, P IEEE, V56, P116
←
1
→