PLASMA-ASSISTED ETCHING OF PAPER

被引：14

作者：

SAPIEHA, S

WROBEL, AM

WERTHEIMER, MR

机构：

[1] ECOLE POLYTECH,COUCHES MINCES GRP,MONTREAL H3C 3A7,QUEBEC,CANADA

[2] ECOLE POLYTECH,DEPT ENGN PHYS,MONTREAL H3C 3A7,QUEBEC,CANADA

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1988年 / 8卷 / 03期

关键词：

D O I：

10.1007/BF01020410

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：331 / 346

页数：16

共 33 条

[1]

ASCHAN PJ, 1980, TAPPI, V63, P59

[2]

BECKMAN NJ, 1973 P TAPPI COAT C, P87

[3] GENERATION OF LARGE VOLUME MICROWAVE PLASMAS [J].

BOSISIO, RG ;

WERTHEIMER, MR ;

WEISSFLOCH, CF .

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1973, 6 (07) :628-630

[4] RELATION OF POLYMER STRUCTURE TO PLASMA-ETCHING BEHAVIOR - ROLE OF ATOMIC FLUORINE [J].

CAIN, SR ;

EGITTO, FD ;

EMMI, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :1578-1584

[5]

Clark DT, 1978, POLYM SURFACES

[6]

DUMITRESCU SV, 1984, CELL CHEM TECHNOL, V18, P125

[7] DECAPSULATION AND PHOTORESIST STRIPPING IN OXYGEN MICROWAVE PLASMAS [J].

DZIOBA, S ;

ESTE, G ;

NAGUIB, HM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) :2537-2541

[8] PLASMA-ETCHING OF ORGANIC MATERIALS .1. POLYIMIDE IN O2-CF4 [J].

EGITTO, FD ;

EMMI, F ;

HORWATH, RS ;

VUKANOVIC, V .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03) :893-904

[9]

Goring D.A.I., 1967, PULP PAPER MAG CAN, V68, pT372

[10]

GORING DAI, 1969, PULP PAPER MAGAZINE, V70, pT390

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