SUBSTITUTIONAL DOPING OF CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICON

被引:54
作者
TANIGUCHI, M
HIROSE, M
OSAKA, Y
机构
关键词
D O I
10.1016/0022-0248(78)90423-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
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页码:126 / 131
页数:6
相关论文
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