CONTAMINATION OF SILICON SURFACES EXPOSED TO CHF3 PLASMAS - AN XPS STUDY OF THE FILM AND THE FILM-SURFACE INTERFACE

被引：44

作者：

CARDINAUD, C

RHOUNNA, A

TURBAN, G

GROLLEAU, B

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 06期

关键词：

D O I：

10.1149/1.2096034

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1472 / 1477

页数：6

共 38 条

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