EFFECT OF O+ AND NE+ IMPLANTATION ON SURFACE CHARACTERISTICS OF THERMALLY OXIDIZED SI

被引：13

作者：

CHOU, NJ

CROWDER, BL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 04期

关键词：

D O I：

10.1063/1.1659098

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1731 / &

共 20 条

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