CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON

被引：668

作者：

DEAL, BE

SKLAR, M

GROVE, AS

SNOW, EH

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1967年 / 114卷 / 03期

关键词：

D O I：

10.1149/1.2426565

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：266 / +

页数：1

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[9] THE OXIDATION OF SILICON IN DRY OXYGEN, WET OXYGEN, AND STEAM
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[10] THE OXIDATION OF SILICON IN DRY OXYGEN, WET OXYGEN AND STEAM SUPPLEMENTARY DATA
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