Sputtering of fullerene by noble gas ions at high fluences

被引：18

作者：

Fink, D

Muller, M

Klett, R

Chadderton, LT

Palmetshofer, L

Kastner, J

Vacik, J

Hnatowicz, V

Popok, P

机构：

[1] AUSTRALIAN NATL UNIV, INST ADV STUDIES, RES SCH PHYS SCI & ENGN, CANBERRA, ACT 2601, AUSTRALIA

[2] CSIRO, IND TECHNOL INST, DIV APPL PHYS, LINDFIELD, NSW 2070, AUSTRALIA

[3] JOHANNES KEPLER UNIV, INST EXPTL PHYS, A-4040 LINZ, AUSTRIA

[4] UNIV VIENNA, INST FESTKORPERPHYS, A-1090 VIENNA, AUSTRIA

[5] CZECHOSLOVAK ACAD SCI, INST NUCL PHYS, CR-25068 PRAGUE, CZECH REPUBLIC

[6] UNIV MINSK, MINSK 220080, BELARUS

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1995年 / 103卷 / 04期

关键词：

D O I：

10.1016/0168-583X(95)00662-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

引用

页码：415 / 422

页数：8

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