CONCENTRATION PROFILES OF HYDROGEN IN TECHNICAL OXIDIC THIN-FILMS AND MULTILAYER SYSTEMS

被引：23

作者：

WAGNER, W ^{[1
]}

RAUCH, F ^{[1
]}

BANGE, K ^{[1
]}

机构：

[1] SCHOTT GLASWERKE,D-6200 WIESBADEN,FED REP GER

来源：

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE | 1989年 / 333卷 / 4-5期

关键词：

D O I：

10.1007/BF00572357

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：478 / 480

页数：3

共 11 条

[1]

BACH H, 1983, GLASTECH BER, V56, P55

[2]

BACH H, 1983, GLASTECH BER, V56, P1

[3]

BACH H, 1983, GLASTECH BER, V56, P29

[4] DEFECT CHEMISTRY AND CONDUCTIVITY EFFECTS IN HETEROGENEOUS SOLID ELECTROLYTES [J].

MAIER, J .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (06) :1524-1535

[5] ION-ASSISTED THIN-FILM DEPOSITION AND APPLICATIONS [J].

MARTIN, PJ .

VACUUM, 1986, 36 (10) :585-590

[6] PROTON DIFFUSION IN TUNGSTEN TRIOXIDE THIN-FILMS [J].

RANDIN, JP ;

VIENNET, R .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (10) :2349-2354

[7] ELECTROCHROMIC PROCESS AT WO3 ELECTRODES PREPARED BY VACUUM EVAPORATION AND ANODIC-OXIDATION OF W [J].

REICHMAN, B ;

BARD, AJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (04) :583-591

[8] THE XEROGEL STRUCTURE OF THERMALLY EVAPORATED TUNGSTEN-OXIDE LAYERS [J].

SCHLOTTER, P ;

PICKELMANN, L .

JOURNAL OF ELECTRONIC MATERIALS, 1982, 11 (02) :207-236

[9] ELECTROCHEMICAL PROPERTIES OF WO3.X(H2O) .1. THE INFLUENCES OF WATER-ADSORPTION AND HYDROXYLATION [J].

YOSHIIKE, N ;

KONDO, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (11) :2283-2287

[10]

Yoshiike N., 1984, J ELECTROCHEM SOC, V131, P2600

← 1 2 →