BIAS EFFECT ON COMPOSITIONAL SEPARATION IN SPUTTERED CO-CR FILMS

被引：2

作者：

TAKEI, K ^{[1
]}

ROGERS, DJ ^{[1
]}

MAEDA, Y ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP, BASIC RES LABS, ATSUGI, KANAGAWA 24301, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1994年 / 33卷 / 10期

关键词：

BIAS SPUTTERING; CO-CR; MAGNETIC RECORDING MEDIA; COMPOSITIONAL SEPARATION; NMR; ION BOMBARDMENT; THIN FILM;

D O I：

10.1143/JJAP.33.5739

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of de substrate bias on compositional separation (CS) in sputtered Co-Cr films is examined using spin-echo Co-59 NMR and transmission electron microscopy. It is observed that the degree of CS decreases monotonically with increasing negative bias voltage. Slight positive bias voltage, however, is found to enhance CS, resulting in increased saturation magnetization and a higher anisotropy field. The elimination of Ar ion bombardment at the film surface during deposition is thought to be effective in enhancing CS.

引用

页码：5739 / 5742

页数：4

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