A UHV-COMPATIBLE PHOTOELECTRON EMISSION MICROSCOPE FOR APPLICATIONS IN SURFACE SCIENCE

被引：197

作者：

ENGEL, W ^{[1
]}

KORDESCH, ME ^{[1
]}

ROTERMUND, HH ^{[1
]}

KUBALA, S ^{[1
]}

VONOERTZEN, A ^{[1
]}

机构：

[1] OHIO UNIV,DEPT PHYS & ASTRON,ATHENS,OH 45701

来源：

ULTRAMICROSCOPY | 1991年 / 36卷 / 1-3期

关键词：

D O I：

10.1016/0304-3991(91)90146-W

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

A three-stage electrostatic photoelectron emission microscope (PEEM) for use as an attachment on a UHV surface analysis chamber is described. The PEEM is intended for surface studies with lateral resolution of the order of 0.1-mu-m where the real-time observation of processes is important.

引用

页码：148 / 153

页数：6

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