SPECTROSCOPIC INVESTIGATIONS OF GAS-PHASE CHEMISTRY DURING LASER-INDUCED PHOTOLYTIC CVD OF W

被引:13
作者
MOGYOROSI, P [1 ]
CARLSSON, JO [1 ]
MORADI, M [1 ]
机构
[1] UNIV UPPSALA,DEPT ELECTR,S-75121 UPPSALA,SWEDEN
关键词
D O I
10.1016/0169-4332(92)90015-P
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Photolytic reactions, induced by irradiating gas mixtures containing WF6 with an ArF excimer laser beam, have been investigated. For an unfocused laser beam (PHI almost-equal-to 0.1 J/cm2) a spectrum characteristic of chemiluminescence was obtained, provided that all the components Ar, H-2 and WF6 were present in the vapour. By increasing the temperature the chemiluminescence ceased. For the focused beam conditions (PHI almost-equal-to 1-2 J/cm2) an emission spectrum characteristic of elemental tungsten was observed. For the same WF6 and H-2 partial pressures but with Ar in the vapour much higher intensities of the tungsten peaks were obtained than when only WF6 or WF6/H-2 were used.
引用
收藏
页码:46 / 51
页数:6
相关论文
共 4 条
[1]   LASER ASSISTED SYNTHESIS OF ULTRAFINE SILICON POWDER [J].
FANTONI, R ;
BORSELLA, E ;
PICCIRILLO, S ;
NANNETTI, CA ;
CECCATO, R ;
ENZO, S .
APPLIED SURFACE SCIENCE, 1989, 43 :308-315
[2]   LOCALIZED LASER CHEMICAL-PROCESSING OF TUNGSTEN FILMS [J].
GROSSMAN, WM ;
KARNEZOS, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04) :843-847
[3]   SOME CONSIDERATIONS OF THE THERMODYNAMICS AND KINETICS OF THE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J].
HITCHMAN, ML ;
JOBSON, AD ;
KWAKMAN, LFT .
APPLIED SURFACE SCIENCE, 1989, 38 (1-4) :312-337
[4]  
STUKE M, 1982, PHYS CHEM, V86, P837