RECENT ADVANCES IN THE PHOTO-DECOMPOSITION MECHANISMS OF DIAZO-OXIDES

被引：18

作者：

PACANSKY, J

机构：

来源：

关键词：

D O I：

10.1002/pen.760201602

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：1049 / 1053

页数：5

共 13 条

[1]

Ando W., 1978, CHEM DIAZONIUM DIAZO

[2]

DINABURG MS, 1964, PHOTOSENSITIVE DIAZO

[3]

MELERA A, 1974, J ORG CHEM, V29, P3705

[4]

Pacansky J., 1977, IBM Technical Disclosure Bulletin, V20

[5]

Pacansky J., 1977, IBM Technical Disclosure Bulletin, V20

[6] PHOTO-CHEMICAL DECOMPOSITION MECHANISMS FOR AZ-TYPE PHOTORESISTS [J].

PACANSKY, J ;

LYERLA, JR .

PACANSKY, J ;

JOHNSON, D .

[8]

PACANSKY J, UNPUBLISHED

[9] ACYLATION BY KETENES AND ISOCYANATES - MECHANISTIC COMPARISON [J].

SATCHELL, DPN ;

SATCHELL, RS .

[10]

SUS O, 1944, LIEBIGS ANN CHEM, V556, P65